Distributed memory cluster.
Cluster with 3 GPU computing nodes.
Common memory computer.
Dynamic light scattering system for colloid nanoparticle hydrodynamic radius and charge measurements with the temperature control range of 0 - 90 ºC.
Plasma cleaning device for glass and silicon substrate cleaning and etching.
High precision system for sample absorbance, transmittance and reflectance spectra measurements.
High sensitivity device for oxidation - reduction potential measurements in sample solutions.
Device for cleaning inorganic substrates from organic contaminants using ultraviolet radiation and ozone gas.
High precision device for sample weighing.