- Unit: Faculty of Physics
- Keywords: Plasma cleaning, etching, silicon, glass, Diener Zepto
- Responsible person: Dr. Karolis Kazlauskas, tel. +370 600 34126,
Plasma cleaning device for glass and silicon substrate cleaning and etching.
Maximum substrate size: length - 300 nm, width - 100 nm. Plasma generator frequency range from 40 kHz to 100 kHz. Continuous tuning of plasma generator power from 0 W to 100 W.
Application. Sample preparation.