Thin film deposition system, KJLC PVD 75, Kurt J. Lesker Company LtD

Thin film deposition system, KJLC PVD 75, Kurt J. Lesker Company LtD

Sukurta: 23 November 2018
Unit: Life Sciences Center
Keywords: Vacuum, magnetronic, evaporation, film formation, biochemistry, biotechnology, microbiology, macrobiology, biomedicine
Responsible person: Danutė Kurečkienė, tel. +370 5 223 4419, tel. +370 5 223 4400

The equipment is used for magnetronic deposition of metals (chromium and gold) on various film thickness under pressure control.

Technical characteristics
Chamber volume is 75 liters; Sampler holder - 30 cm in diameter; Magnetron target size (diameter) 50.8 mm wit the deposition chimney; Heating up to 350 ˚C; Basic chamber pressure 2x10-7 Torr. 

Application. Magnetronic deposition of metals (gold, chromium) various film thickness under pressure control