Plasma cleaning device Diener Zepto

Unit: Faculty of Physics
Keywords: Plasma cleaning, etching, silicon, glass, Diener Zepto
Responsible person: Dr. Karolis Kazlauskas, tel. +370 600 34126,

Plasma cleaning device for glass and silicon substrate cleaning and etching.

Maximum substrate size: length - 300 nm, width - 100 nm. Plasma generator frequency range from 40 kHz to 100 kHz. Continuous tuning of plasma generator power from 0 W to 100 W.

Application. Sample preparation.


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